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Morphology Study of Si Surface Topography Irradiated by Ar Ion Beam Sputtering

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1TitleTitle of DocumentMorphology Study of Si Surface Topography Irradiated by Ar Ion Beam Sputtering
2CreatorAuthor's name, affiliation, country HONGMEI BI, YING LIANG* and BO WANG
Science Department, Heilongjiang Bayi Agricultural University, China
3SubjectDicipline(s) Chemical Science
3SubjectKeywords Silicon, Ar ion beam, Roughness
4DescriptionAbstract In this paper, Si crystal (000) surface was bombarded by Ar ion beam, with the energy of 90 KeV and the irradiating time of 10 min. In the process of irradiation, there were bulges on the surface of Si crystal surface, the highest of which reached 100 nm. The information of roughness (such as change in level, angle and etc.) were studied by AFM, TEM, SEM and Raman
5PublishersOrganizing agency, location WWW Publications, India
6Contributor Sponsor(s) -
7DateDate (YYYY-MM-DD) -
8TypeStatus & genre Peer-reviewed Article
8TypeType
9FormateFile Formate PDF
10IdentifierUniform Resource Identifier Click Here
10IdentifierDigital Object Identifier
11SourceJournal/conference title; vol., no. (Year)Chemical Science Transactions, Volume  4 , Number  (2), (2015)
12LanuguageEnglish=en en
13RelationSupp.files
14Coverage -
15CopyrightCopyright and permissions
Chemical Science Transactions | Chem Sci Trans | CST | Online Chemistry Journal | Open Access
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